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Growth and characterization of single and mixed metal oxides by ALCVD on various surfaces for high-k gate stack applications

Date

2002
Presentation
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dc.contributor.authorCaymax, Matty
dc.contributor.authorBrijs, Bert
dc.contributor.authorCarter, Richard
dc.contributor.authorClaes, Martine
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorDelabie, Annelies
dc.contributor.authorHeyns, Marc
dc.contributor.authorRichard, Olivier
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorZhao, Chao
dc.contributor.authorMaes, Jan
dc.contributor.authorChen, Jerry
dc.contributor.authorCosnier, Vincent
dc.contributor.authorGreen, Martin
dc.contributor.authorKaushik, Vidya
dc.contributor.authorKluth, Jon
dc.contributor.authorTsai, Wilman
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorMaes, Jan
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.date.accessioned2021-10-14T21:12:51Z
dc.date.available2021-10-14T21:12:51Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6087
dc.source.conferenceAtomic Layer Deposition Conference - ALD
dc.source.conferencedate19/08/2002
dc.source.conferencelocationKorea Seoul
dc.title

Growth and characterization of single and mixed metal oxides by ALCVD on various surfaces for high-k gate stack applications

dc.typeOral presentation
dspace.entity.typePublication
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