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Conference contributions
Influence of doping profile and halo implantation on the threshold voltage mismatch of a 0.13μm CMOS technology
Publication:
Influence of doping profile and halo implantation on the threshold voltage mismatch of a 0.13μm CMOS technology
Date
2002
Proceedings Paper
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6320.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Croon, Jeroen
;
Augendre, Emmanuel
;
Decoutere, Stefaan
;
Sansen, Willy
;
Maes, Herman
Journal
Abstract
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1892
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations
Metrics
Views
1892
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations