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Microroughness of clean silicon surfaces and gate oxide breakdown

dc.contributor.authorDepas, Michel
dc.contributor.authorCrossley, A.
dc.contributor.authorVermeire, Bert
dc.contributor.authorMertens, Paul
dc.contributor.authorSofield, C. J.
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-09-29T13:05:39Z
dc.date.available2021-09-29T13:05:39Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/619
dc.sourceIIOimport
dc.titleMicroroughness of clean silicon surfaces and gate oxide breakdown
dc.typeMeeting abstract
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference26th IEEE Semiconductor Interface Specialists' Conference
dc.source.conferencedate7/12/1995
dc.source.conferencelocationCharleston, SC USA
imec.availabilityPublished - open access


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