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Aerial image simulations of soft and phase defects in 193-nm lithography for 10-nm node

dc.contributor.authorDriessen, Frank
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorJonckheere, Rik
dc.contributor.authorLiu, Hua-Yu
dc.contributor.authorKarklin, Linard
dc.date.accessioned2021-10-14T21:32:42Z
dc.date.available2021-10-14T21:32:42Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6287
dc.sourceIIOimport
dc.titleAerial image simulations of soft and phase defects in 193-nm lithography for 10-nm node
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1180
dc.source.endpage1189
dc.source.conferenceOptical Microlithography XV
dc.source.conferencedate5/03/2002
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 4691


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