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Complementary phase-shift mask towards 70-nm technology node

dc.contributor.authorDriessen, Frank
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorErcken, Monique
dc.contributor.authorMontgomery, Patrick
dc.contributor.authorRonse, Kurt
dc.contributor.authorVan Adrichem, Paul
dc.contributor.authorLi, J.
dc.contributor.authorLiu, H.Y.
dc.contributor.authorKarklin, L.
dc.date.accessioned2021-10-14T21:32:50Z
dc.date.available2021-10-14T21:32:50Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6288
dc.sourceIIOimport
dc.titleComplementary phase-shift mask towards 70-nm technology node
dc.typeProceedings paper
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan Adrichem, Paul
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.beginpageAddendum
dc.source.conferenceOptical Microlithography XV
dc.source.conferencedate5/03/2002
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - imec


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