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Dual damascene patterning for full spin-on stack of porous low-K material

dc.contributor.authorFurukawa, Yukiko
dc.contributor.authorKokubo, Terukazu
dc.contributor.authorStruyf, Herbert
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorGravesteijn, Dirk
dc.date.accessioned2021-10-14T21:39:44Z
dc.date.available2021-10-14T21:39:44Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6339
dc.sourceIIOimport
dc.titleDual damascene patterning for full spin-on stack of porous low-K material
dc.typeProceedings paper
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.beginpage45
dc.source.endpage47
dc.source.conferenceProceedings of the IEEE International Interconnect Technology Conference
dc.source.conferencedate3/06/2002
dc.source.conferencelocationBurlingame, CA USA
imec.availabilityPublished - imec


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