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Characteristics of low-k and ultralow-k PECVD deposited SiCOH films

dc.contributor.authorGrill, A.
dc.contributor.authorPatel, V.
dc.contributor.authorRodbell, K.P.
dc.contributor.authorHuang, E.
dc.contributor.authorChristiansen, S.
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-14T21:43:57Z
dc.date.available2021-10-14T21:43:57Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6368
dc.sourceIIOimport
dc.titleCharacteristics of low-k and ultralow-k PECVD deposited SiCOH films
dc.typeProceedings paper
dc.source.peerreviewno
dc.source.beginpage569
dc.source.endpage574
dc.source.conferenceSilicon Materials - Processing, Characterization, and Reliability
dc.source.conferencedate1/04/2002
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec
imec.internalnotesMRS Proceedings; Vol.716


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