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Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: an overview of preliminary results

dc.contributor.authorHourd, Andrew C.
dc.contributor.authorGrimshaw, Anthony
dc.contributor.authorScheuring, Gerd
dc.contributor.authorGittinger, Christian
dc.contributor.authorBrück, Hans-Jürgen
dc.contributor.authorChen, Shiuh-Bin
dc.contributor.authorChen, Parkson W.
dc.contributor.authorHartmann, Hans
dc.contributor.authorOrdynskyy, Vladimir
dc.contributor.authorJonckheere, Rik
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorSchätz, Thomas
dc.contributor.authorSommer, Karl
dc.date.accessioned2021-10-14T21:50:09Z
dc.date.available2021-10-14T21:50:09Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6407
dc.sourceIIOimport
dc.titleAdvanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: an overview of preliminary results
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewno
dc.source.beginpage168
dc.source.endpage174
dc.source.conference18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
dc.source.conferencedate14/01/2002
dc.source.conferencelocationMünchen Germany
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 4764


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