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A low temperature technology on the base of hydrogen enhanced thermal donor formation for future high voltage applications

dc.contributor.authorJob, R.
dc.contributor.authorUlyashin, A.G.
dc.contributor.authorFahrner, W.R.
dc.contributor.authorNiedernostheide, F.J.
dc.contributor.authorSchulze, H. J.
dc.contributor.authorSimoen, Eddy
dc.contributor.authorClaeys, Cor
dc.contributor.authorTonelli, G.
dc.date.accessioned2021-10-14T21:55:51Z
dc.date.available2021-10-14T21:55:51Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6442
dc.sourceIIOimport
dc.titleA low temperature technology on the base of hydrogen enhanced thermal donor formation for future high voltage applications
dc.typeProceedings paper
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage405
dc.source.endpage413
dc.source.conferenceProceedings of the 11th International Workshop on Physics of Semiconductor Devices
dc.source.conferencedate11/12/2001
dc.source.conferencelocationDelhi India
imec.availabilityPublished - open access


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