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Optical solutions for contact hole lithography at the 90nm node and beyond

dc.contributor.authorKöhler, C.
dc.contributor.authorElbattay, K.
dc.contributor.authorHansen, S.
dc.contributor.authorFinders, Jo
dc.contributor.authorSocha, R.
dc.contributor.authorvan den Broeke, D.
dc.contributor.authorWiaux, Vincent
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorGräupner, P.
dc.date.accessioned2021-10-14T22:04:12Z
dc.date.available2021-10-14T22:04:12Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6492
dc.sourceIIOimport
dc.titleOptical solutions for contact hole lithography at the 90nm node and beyond
dc.typeProceedings paper
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorVandenberghe, Geert
dc.source.peerreviewno
dc.source.conferenceSemicon Japan: SEMI Technology Symposium
dc.source.conferencedate4/12/2002
dc.source.conferencelocationJapan
imec.availabilityPublished - imec


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