Sub 100nm particle removal with deionized water and a megasonic frequency of 835kHz

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Authors
Lauerhaas, Jeff; Wu, Y.; Xu, Kaidong; Vereecke, Guy; Vos, Rita; Kenis, Karine; Mertens, Paul; Nicolosi, T.; Heyns, Marc
Conference
Cleaning Technology in Semiconductor Device Manufacturing VII
Title
Sub 100nm particle removal with deionized water and a megasonic frequency of 835kHz
Publication type
Proceedings paper
Embargo date
9999-12-31
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