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Sub 100nm particle removal with deionized water and a megasonic frequency of 835kHz

dc.contributor.authorLauerhaas, Jeff
dc.contributor.authorWu, Y.
dc.contributor.authorXu, Kaidong
dc.contributor.authorVereecke, Guy
dc.contributor.authorVos, Rita
dc.contributor.authorKenis, Karine
dc.contributor.authorMertens, Paul
dc.contributor.authorNicolosi, T.
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-14T22:08:57Z
dc.date.available2021-10-14T22:08:57Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6519
dc.sourceIIOimport
dc.titleSub 100nm particle removal with deionized water and a megasonic frequency of 835kHz
dc.typeProceedings paper
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage145
dc.source.endpage146
dc.source.conferenceCleaning Technology in Semiconductor Device Manufacturing VII
dc.source.conferencedate4/09/2001
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. 2001-26


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