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dc.contributor.authorLauwers, Anne
dc.contributor.authorde Potter de ten Broeck, Muriel
dc.contributor.authorLindsay, Richard
dc.contributor.authorChamirian, Oxana
dc.contributor.authorDemeurisse, Caroline
dc.contributor.authorVrancken, Christa
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-14T22:10:41Z
dc.date.available2021-10-14T22:10:41Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6529
dc.sourceIIOimport
dc.titleLinewidth dependence of the reverse bias junction leakage for co-silicided source/drain junctions
dc.typeProceedings paper
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorde Potter de ten Broeck, Muriel
dc.contributor.imecauthorDemeurisse, Caroline
dc.contributor.imecauthorVrancken, Christa
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage29
dc.source.endpage34
dc.source.conferenceSilicon Materials - Processing, Characterization, and Reliability
dc.source.conferencedate1/04/2002
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec
imec.internalnotesMRS Proceedings; Vol. 716


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