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Model-based design improvements for the 100nm lithography generation

dc.contributor.authorLucas, Kevin
dc.contributor.authorPostnikov, Sergei
dc.contributor.authorPatterson, Kyle
dc.contributor.authorYuan, Min-Chi
dc.contributor.authorThomas, Carla
dc.contributor.authorThompson, Matt
dc.contributor.authorCarter, Rusty
dc.contributor.authorLitt, Lloyd
dc.contributor.authorMontgomery, Patrick
dc.contributor.authorWimmer, Karl
dc.date.accessioned2021-10-14T22:15:37Z
dc.date.available2021-10-14T22:15:37Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6557
dc.sourceIIOimport
dc.titleModel-based design improvements for the 100nm lithography generation
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage215
dc.source.endpage226
dc.source.conferenceOptical Microlithograhy XV
dc.source.conferencedate5/03/2002
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 4691


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