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Impact of ALCVD and PVD titanium nitride deposition on metal gate capacitors

dc.contributor.authorLujan, Guilherme
dc.contributor.authorSchram, Tom
dc.contributor.authorPantisano, Luigi
dc.contributor.authorHooker, Jacob
dc.contributor.authorKubicek, Stefan
dc.contributor.authorRöhr, Erika
dc.contributor.authorSchuhmacher, Jörg
dc.contributor.authorKilpela, Olli
dc.contributor.authorSprey, Hessel
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorDe Meyer, Kristin
dc.date.accessioned2021-10-14T22:16:02Z
dc.date.available2021-10-14T22:16:02Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6559
dc.sourceIIOimport
dc.titleImpact of ALCVD and PVD titanium nitride deposition on metal gate capacitors
dc.typeProceedings paper
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorSprey, Hessel
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage583
dc.source.endpage586
dc.source.conferenceESSDERC - 32nd European Solid-State Device Research Conference
dc.source.conferencedate24/09/2002
dc.source.conferencelocationFirenze Italy
imec.availabilityPublished - open access


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