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OPC aware mask and wafer metrology

dc.contributor.authorMaurer, Wilhelm
dc.contributor.authorWiaux, Vincent
dc.contributor.authorJonckheere, Rik
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorHoffmann, Thomas
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorRonse, Kurt
dc.contributor.authorEngland, Jonathan G.
dc.contributor.authorHoward, William B.
dc.date.accessioned2021-10-14T22:21:57Z
dc.date.available2021-10-14T22:21:57Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6591
dc.sourceIIOimport
dc.titleOPC aware mask and wafer metrology
dc.typeProceedings paper
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecWiaux, Vincent::0000-0002-8923-5708
dc.source.peerreviewno
dc.source.beginpage175
dc.source.endpage181
dc.source.conference18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
dc.source.conferencedate14/01/2002
dc.source.conferencelocationMünchen Germany
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 4764


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