Publication:
Optimization of Reactive Ion Etching of Al0.48In0.52As in CH4/H2 and its Application to Dry Gate Recess of HEMT's
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33308 since deposited on 2021-09-29
1last week
Acq. date: 2025-11-03
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Metrics
Views
33308 since deposited on 2021-09-29
1last week
Acq. date: 2025-11-03
Citations