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Printability of hard and soft defects in 193-nm lithography

dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorJonckheere, Rik
dc.contributor.authorKohlpoth, Stephanie
dc.contributor.authorFriedrich, Christoph M.
dc.contributor.authorTorres, Juan Andres
dc.date.accessioned2021-10-14T22:47:29Z
dc.date.available2021-10-14T22:47:29Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6719
dc.sourceIIOimport
dc.titlePrintability of hard and soft defects in 193-nm lithography
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.beginpage95
dc.source.endpage111
dc.source.conference18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
dc.source.conferencedate14/01/2002
dc.source.conferencelocationMünchen Germany
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 4764


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