Defect printability for 100-nm design rule using 193nm lithography

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Authors
Philipsen, Vicky; Jonckheere, Rik; Kohlpoth, Stephanie; Torres, Andres
Conference
Photomask and Next-Generation Lithography Mask Technology IX
Title
Defect printability for 100-nm design rule using 193nm lithography
Publication type
Proceedings paper
Embargo date
9999-12-31
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