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Defect printability for 100-nm design rule using 193nm lithography

dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorJonckheere, Rik
dc.contributor.authorKohlpoth, Stephanie
dc.contributor.authorTorres, Andres
dc.date.accessioned2021-10-14T22:47:42Z
dc.date.available2021-10-14T22:47:42Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6720
dc.sourceIIOimport
dc.titleDefect printability for 100-nm design rule using 193nm lithography
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage640
dc.source.endpage651
dc.source.conferencePhotomask and Next-Generation Lithography Mask Technology IX
dc.source.conferencedate23/04/2002
dc.source.conferencelocationYokohama Japan
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 4754


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