dc.contributor.author | Pichon, L. | |
dc.contributor.author | Mercha, Abdelkarim | |
dc.contributor.author | Routoure, J. M. | |
dc.contributor.author | Carin, R. | |
dc.contributor.author | Bonnaud, O. | |
dc.contributor.author | Mohammed-Brahim, T. | |
dc.date.accessioned | 2021-10-14T22:47:53Z | |
dc.date.available | 2021-10-14T22:47:53Z | |
dc.date.issued | 2002 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/6721 | |
dc.source | IIOimport | |
dc.title | Meyer-Neldel parameter as a figure of merit for quality of thin-film-transistor active layer? | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Mercha, Abdelkarim | |
dc.contributor.orcidimec | Mercha, Abdelkarim::0000-0002-2174-6958 | |
dc.source.peerreview | no | |
dc.source.conference | E-MRS Spring Meeting Symposium K: Thin Film Materials for Large-Area Electronics | |
dc.source.conferencedate | 18/06/2002 | |
dc.source.conferencelocation | Strasbourg France | |
imec.availability | Published - imec | |