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Ultra thin plasma nitrided oxides for sub-100nm CMOS

dc.contributor.authorRothschild, Aude
dc.contributor.authorVeloso, Anabela
dc.contributor.authorMertens, Sofie
dc.contributor.authorSchaekers, Marc
dc.contributor.authorCubaynes, Florence
dc.contributor.authorDate, Lucien
dc.contributor.authorPique, Didier
dc.date.accessioned2021-10-14T22:58:35Z
dc.date.available2021-10-14T22:58:35Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6773
dc.sourceIIOimport
dc.titleUltra thin plasma nitrided oxides for sub-100nm CMOS
dc.typeOral presentation
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorMertens, Sofie
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorDate, Lucien
dc.contributor.orcidimecMertens, Sofie::0000-0002-1482-6730
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.source.peerreviewno
dc.source.conference5th Technical and Scientific Meeting of CREMSI: New Tools and Processes for Thin Active Layers in the Advanced FEOL Techniques
dc.source.conferencedate14/11/2002
dc.source.conferencelocationFuveau France
imec.availabilityPublished - imec


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