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A study of growth mechanism of TiN and WCN barrier films deposited by atomic layer deposition on different substrates

dc.contributor.authorSatta, Alessandra
dc.contributor.authorSchuhmacher, Jörg
dc.contributor.authorWhelan, Caroline
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorBrongersma, Sywert
dc.contributor.authorBeyer, Gerald
dc.contributor.authorBrijs, Bert
dc.contributor.authorConard, Thierry
dc.contributor.authorMaex, Karen
dc.contributor.authorVantomme, Andre
dc.contributor.authorViitanen, M.M.
dc.contributor.authorBrongersma, H.H.
dc.date.accessioned2021-10-14T23:02:37Z
dc.date.available2021-10-14T23:02:37Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6791
dc.sourceIIOimport
dc.titleA study of growth mechanism of TiN and WCN barrier films deposited by atomic layer deposition on different substrates
dc.typeMeeting abstract
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorBrongersma, Sywert
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorVantomme, Andre
dc.contributor.orcidimecBrongersma, Sywert::0000-0002-1755-3897
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.source.peerreviewno
dc.source.beginpage21
dc.source.conferenceB-ALD-5: The 5th Baltic Symposium on Atomic Layer Deposition
dc.source.conferencedate24/10/2002
dc.source.conferencelocationTartu Estonia
imec.availabilityPublished - imec


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