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Evaluation of Ta(N) diffusion barrier integrity on porous low-k films

dc.contributor.authorShamiryan, Denis
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorTokei, Zsolt
dc.contributor.authorIacopi, Francesca
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-14T23:08:36Z
dc.date.available2021-10-14T23:08:36Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6819
dc.sourceIIOimport
dc.titleEvaluation of Ta(N) diffusion barrier integrity on porous low-k films
dc.typeProceedings paper
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage279
dc.source.endpage285
dc.source.conferenceAdvanced Metallization Conference 2001
dc.source.conferencedate9/10/2001
dc.source.conferencelocationMontreal Canada
imec.availabilityPublished - imec
imec.internalnotesConference Proceedings ULSI XVII


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