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Lithography for sub-90nm applications

dc.contributor.authorVan den hove, Luc
dc.contributor.authorGoethals, Mieke
dc.contributor.authorRonse, Kurt
dc.contributor.authorVan Bavel, Mieke
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-14T23:31:37Z
dc.date.available2021-10-14T23:31:37Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6924
dc.sourceIIOimport
dc.titleLithography for sub-90nm applications
dc.typeProceedings paper
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan Bavel, Mieke
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage3
dc.source.endpage8
dc.source.conferenceIEDM Technical Digest
dc.source.conferencedate9/12/2002
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access


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