Electron diffraction contrast imaging as a tool for nano-range strain analysis and application to a semiconductor laser structure
dc.contributor.author | Janssens, Koenraad | |
dc.contributor.author | Vanhellemont, Jan | |
dc.contributor.author | Maes, Herman | |
dc.contributor.author | Van Der Biest, O. | |
dc.contributor.author | Hull, R. | |
dc.date.accessioned | 2021-09-29T13:07:59Z | |
dc.date.available | 2021-09-29T13:07:59Z | |
dc.date.issued | 1995 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/694 | |
dc.source | IIOimport | |
dc.title | Electron diffraction contrast imaging as a tool for nano-range strain analysis and application to a semiconductor laser structure | |
dc.type | Proceedings paper | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 579 | |
dc.source.endpage | 582 | |
dc.source.conference | Microscopy of Semiconducting Materials 1995. Proceedings | |
dc.source.conferencedate | 20/03/1995 | |
dc.source.conferencelocation | Oxford UK | |
imec.availability | Published - open access | |
imec.internalnotes | IOP Conference Series; Vol. 146 |