Performance optimization of the double-exposure alternating PSM for (sub-)100-nm ICs

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Authors
Vandenberghe, Geert; Driessen, Frank; Van Adrichem, Paul; Ronse, Kurt; Li, Jason; Karklin, Linard
Conference
21st Annual BACUS Symposium on Photomask Technology
Title
Performance optimization of the double-exposure alternating PSM for (sub-)100-nm ICs
Publication type
Proceedings paper
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