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Physical characterisation of high-gate stacks

dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorBender, Hugo
dc.contributor.authorConard, Thierry
dc.contributor.authorRichard, Olivier
dc.contributor.authorZhao, Chao
dc.contributor.authorBrijs, Bert
dc.contributor.authorCaymax, Matty
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorCosnier, Vincent
dc.contributor.authorChen, Jerry
dc.contributor.authorKluth, J.
dc.contributor.authorCartier, Eduard
dc.contributor.authorGreen, Martin
dc.date.accessioned2021-10-14T23:44:30Z
dc.date.available2021-10-14T23:44:30Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6982
dc.sourceIIOimport
dc.titlePhysical characterisation of high-gate stacks
dc.typeOral presentation
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conferenceMRS Fall Meeting Symposium N: Novel Materials and Processes for Advanced CMOS
dc.source.conferencedate2/12/2002
dc.source.conferencelocationBoston, MA USA
imec.availabilityPublished - imec


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