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Assessment of OPC effectiveness using two-dimensional metrics

dc.contributor.authorWiaux, Vincent
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorHoffmann, Thomas
dc.contributor.authorRonse, Kurt
dc.contributor.authorHoward, William B.
dc.contributor.authorMaurer, Wilhelm
dc.contributor.authorPreil, Moshe E.
dc.date.accessioned2021-10-15T00:01:26Z
dc.date.available2021-10-15T00:01:26Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7053
dc.sourceIIOimport
dc.titleAssessment of OPC effectiveness using two-dimensional metrics
dc.typeProceedings paper
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage395
dc.source.endpage406
dc.source.conferenceOptical Microlithography XV
dc.source.conferencedate5/03/2002
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 4691


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