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Initial growth kinetics of ALD Al2O3 and HfO2 and post-annealing effects

dc.contributor.authorWilk, G.D.
dc.contributor.authorFrank, M.
dc.contributor.authorHo, M.Y.
dc.contributor.authorGreen, Martin
dc.contributor.authorChabal, Y.J.
dc.contributor.authorRaisanen, P.
dc.contributor.authorBrijs, Bert
dc.contributor.authorSorsch, T.W.
dc.date.accessioned2021-10-15T00:01:57Z
dc.date.available2021-10-15T00:01:57Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7055
dc.sourceIIOimport
dc.titleInitial growth kinetics of ALD Al2O3 and HfO2 and post-annealing effects
dc.typeOral presentation
dc.source.peerreviewno
dc.source.conferenceAtomic Layer Deposition Conference - ALD
dc.source.conferencedate19/08/2002
dc.source.conferencelocationSeoul Korea
imec.availabilityPublished - imec


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