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A new ultra-low K ILD material based on organic-inorganic hybrid resins

dc.contributor.authorZhong, Ben
dc.contributor.authorMeynen, Herman
dc.contributor.authorIacopi, Francesca
dc.contributor.authorWeidner, Ken
dc.contributor.authorMalhouitre, Stéphane
dc.contributor.authorMoyer, Eric
dc.contributor.authorBargeron, Cory
dc.contributor.authorSchalk, Paul
dc.contributor.authorPeck, Alan
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-15T00:15:45Z
dc.date.available2021-10-15T00:15:45Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7110
dc.sourceIIOimport
dc.titleA new ultra-low K ILD material based on organic-inorganic hybrid resins
dc.typeProceedings paper
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpageB12.4
dc.source.conferenceSilicon Materials - Processing, Characterization, and Reliability
dc.source.conferencedate1/04/2002
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec
imec.internalnotesMRS Symposium Proceedings; Vol. 716


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