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dc.contributor.authorAkheyar, Amal
dc.contributor.authorLauwers, Anne
dc.contributor.authorKittl, Jorge
dc.contributor.authorde Potter de ten Broeck, Muriel
dc.contributor.authorChamirian, Oxana
dc.contributor.authorJonckheere, Rik
dc.contributor.authorLeunissen, Peter
dc.contributor.authorVan Dal, Mark
dc.contributor.authorLindsay, Richard
dc.contributor.authorTempel, Georg
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-15T03:58:41Z
dc.date.available2021-10-15T03:58:41Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7127
dc.sourceIIOimport
dc.titleCo-silicide, Co(Ni)-silicide and Ni-silicide to source/drain contact resistance
dc.typeProceedings paper
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorde Potter de ten Broeck, Muriel
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan Dal, Mark
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.beginpage197
dc.source.endpage204
dc.source.conferenceAdvanced Short-Time Thermal Processing for Si-based CMOS devices
dc.source.conferencedate27/04/2003
dc.source.conferencelocationParis France
imec.availabilityPublished - imec
imec.internalnotesElectrochemical Society Proceedings; PV 2003-14


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