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Surface passivation and microroughness of (100) silicon etched in aqueous hydrogen halide (HF, HCl, HBr, Hl) solutions
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Authors
Li, Li
;
Bender, Hugo
;
Trenkler, Thomas
;
Mertens, Paul
;
Meuris, Marc
;
Vandervorst, Wilfried
;
Heyns, Marc
Issue
3
Journal
Journal of Applied Physics
Volume
77
Title
Surface passivation and microroughness of (100) silicon etched in aqueous hydrogen halide (HF, HCl, HBr, Hl) solutions
Publication type
Journal article
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