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Surface passivation and microroughness of (100) silicon etched in aqueous hydrogen halide (HF, HCl, HBr, Hl) solutions
Publication:
Surface passivation and microroughness of (100) silicon etched in aqueous hydrogen halide (HF, HCl, HBr, Hl) solutions
Date
1995
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Li, Li
;
Bender, Hugo
;
Trenkler, Thomas
;
Mertens, Paul
;
Meuris, Marc
;
Vandervorst, Wilfried
;
Heyns, Marc
Journal
Journal of Applied Physics
Abstract
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2061
since deposited on 2021-09-29
410
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Acq. date: 2025-10-24
Citations
Metrics
Views
2061
since deposited on 2021-09-29
410
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations