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C-AFM Characterization of the dependance of AlHfOx electrical behaviour on post deposition annealing temperature

dc.contributor.authorBlasco, X.
dc.contributor.authorPetry, Jasmine
dc.contributor.authorNafria, M.
dc.contributor.authorAymerich, X.
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-15T04:02:01Z
dc.date.available2021-10-15T04:02:01Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7222
dc.sourceIIOimport
dc.titleC-AFM Characterization of the dependance of AlHfOx electrical behaviour on post deposition annealing temperature
dc.typeOral presentation
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewno
dc.source.conference13th Bi-Annual Conference on Insulating Films on Semiconductors - INFOS
dc.source.conferencedate18/06/2003
dc.source.conferencelocationBarcelona Spain
imec.availabilityPublished - imec


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