dc.contributor.author | Bogaerts, Wim | |
dc.contributor.author | Dumon, Pieter | |
dc.contributor.author | Wiaux, Vincent | |
dc.contributor.author | Wouters, Johan M. D. | |
dc.contributor.author | Beckx, Stephan | |
dc.contributor.author | Baets, Roel | |
dc.date.accessioned | 2021-10-15T04:02:40Z | |
dc.date.available | 2021-10-15T04:02:40Z | |
dc.date.issued | 2003-09 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7233 | |
dc.source | IIOimport | |
dc.title | Tolerance control for photonic crystal structures fabricated with deep UV lithography | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Bogaerts, Wim | |
dc.contributor.imecauthor | Wiaux, Vincent | |
dc.contributor.imecauthor | Wouters, Johan M. D. | |
dc.contributor.imecauthor | Beckx, Stephan | |
dc.contributor.imecauthor | Baets, Roel | |
dc.contributor.orcidimec | Bogaerts, Wim::0000-0003-1112-8950 | |
dc.contributor.orcidimec | Baets, Roel::0000-0003-1266-1319 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 46 | |
dc.source.endpage | 47 | |
dc.source.conference | Proceedings 29th European Conference on Optical Communication - ECOC | |
dc.source.conferencedate | 21/09/2003 | |
dc.source.conferencelocation | Rimini Italy | |
imec.availability | Published - open access | |