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High-k dielectric characterization by combined VUV spectroscopic ellipsometry and X-ray reflectometry

dc.contributor.authorBoher, P.
dc.contributor.authorEvrard, P.
dc.contributor.authorDefranoux, C.
dc.contributor.authorDarragon, A.
dc.contributor.authorSun, Lianchao
dc.contributor.authorFouere, J.C.
dc.contributor.authorStehlé, J.L.
dc.contributor.authorBellandi, E.
dc.contributor.authorBender, Hugo
dc.date.accessioned2021-10-15T04:03:00Z
dc.date.available2021-10-15T04:03:00Z
dc.date.issued2003-12
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7239
dc.sourceIIOimport
dc.titleHigh-k dielectric characterization by combined VUV spectroscopic ellipsometry and X-ray reflectometry
dc.typeProceedings paper
dc.contributor.imecauthorBender, Hugo
dc.source.peerreviewno
dc.source.conferenceMRS Fall Meeting Symposium E: Fundamentals of Novel Oxide/Semiconductor Interfaces
dc.source.conferencedate1/12/2003
dc.source.conferencelocationBoston, MA USA
imec.availabilityPublished - imec


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