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High-k dielectric characterization by VUV spectroscopic ellipsometry and X-ray reflection

dc.contributor.authorBoher, P.
dc.contributor.authorEvrard, P.
dc.contributor.authorDefranoux, C.
dc.contributor.authorFouere, J.C.
dc.contributor.authorBellandi, E.
dc.contributor.authorBender, Hugo
dc.date.accessioned2021-10-15T04:03:04Z
dc.date.available2021-10-15T04:03:04Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7240
dc.sourceIIOimport
dc.titleHigh-k dielectric characterization by VUV spectroscopic ellipsometry and X-ray reflection
dc.typeProceedings paper
dc.contributor.imecauthorBender, Hugo
dc.source.peerreviewno
dc.source.beginpage148
dc.source.endpage153
dc.source.conferenceCharacterization and Metrology of ULSI Technology
dc.source.conferencedate24/03/2003
dc.source.conferencelocationAustin, TX USA
imec.availabilityPublished - imec
imec.internalnotesAIP Conference Proceedings, Vol. 683


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