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Correlation between charge Injection and trapping in SiO2/HfO2 gate stacks

dc.contributor.authorCartier, Eduard
dc.contributor.authorPantisano, Luigi
dc.contributor.authorKerber, Andreas
dc.contributor.authorGroeseneken, Guido
dc.date.accessioned2021-10-15T04:06:32Z
dc.date.available2021-10-15T04:06:32Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7288
dc.sourceIIOimport
dc.titleCorrelation between charge Injection and trapping in SiO2/HfO2 gate stacks
dc.typeOral presentation
dc.contributor.imecauthorGroeseneken, Guido
dc.source.peerreviewno
dc.source.conferenceInsulating Films on Semiconductors Conference - INFOS. 13th Bi-Annual Conference
dc.source.conferencedate18/06/2003
dc.source.conferencelocationBarcelona Spain
imec.availabilityPublished - imec


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