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Metal film characterization with qualified spreading resistance

dc.contributor.authorClarysse, Trudo
dc.contributor.authorHoflijk, Ilse
dc.contributor.authorZhang, Wenqi
dc.contributor.authorMaex, Karen
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-15T04:10:15Z
dc.date.available2021-10-15T04:10:15Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7331
dc.sourceIIOimport
dc.titleMetal film characterization with qualified spreading resistance
dc.typeProceedings paper
dc.contributor.imecauthorHoflijk, Ilse
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewno
dc.source.beginpage305
dc.source.endpage313
dc.source.conferenceUltra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic.
dc.source.conferencedate27/04/2003
dc.source.conferencelocationSanta Cruz, CA USA
imec.availabilityPublished - imec


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