Publication:

(TOF-)SIMS profiling of HfO2/Si stacks: Is there a way to minimize the artefacts

Date

2003
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Author(s)

Conard, Thierry  
;
Huyghebaert, Cedric  
;
Vandervorst, Wilfried  

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Abstract

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1843 since deposited on 2021-10-15
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