dc.contributor.author | Dachs, Charles | |
dc.contributor.author | Surdeanu, Radu | |
dc.contributor.author | Pawlak, Bartek | |
dc.contributor.author | Doornbos, Gerben | |
dc.contributor.author | Duffy, R. | |
dc.contributor.author | Heringa, Anco | |
dc.contributor.author | Ponomarev, Youri | |
dc.contributor.author | Venezia, Vincent | |
dc.contributor.author | Van Dal, Mark | |
dc.contributor.author | Stolk, P. | |
dc.contributor.author | Lindsay, Richard | |
dc.contributor.author | Henson, Kirklen | |
dc.contributor.author | Dieu, B. | |
dc.contributor.author | Geenen, Luc | |
dc.contributor.author | Hoflijk, Ilse | |
dc.contributor.author | Richard, Olivier | |
dc.contributor.author | Clarysse, Trudo | |
dc.contributor.author | Brijs, Bert | |
dc.contributor.author | Vandervorst, Wilfried | |
dc.contributor.author | Pagès, Xavier | |
dc.date.accessioned | 2021-10-15T04:14:43Z | |
dc.date.available | 2021-10-15T04:14:43Z | |
dc.date.issued | 2003 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7374 | |
dc.source | IIOimport | |
dc.title | CMOS scaling beyond the 90 nm CMOS technology node: shallow junction and integration challenges | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Pawlak, Bartek | |
dc.contributor.imecauthor | Doornbos, Gerben | |
dc.contributor.imecauthor | Van Dal, Mark | |
dc.contributor.imecauthor | Hoflijk, Ilse | |
dc.contributor.imecauthor | Richard, Olivier | |
dc.contributor.imecauthor | Vandervorst, Wilfried | |
dc.contributor.orcidimec | Richard, Olivier::0000-0002-3994-8021 | |
dc.source.peerreview | no | |
dc.source.beginpage | 15 | |
dc.source.endpage | 22 | |
dc.source.conference | Ultra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic. | |
dc.source.conferencedate | 27/04/2003 | |
dc.source.conferencelocation | Santa Cruz, CA USA | |
imec.availability | Published - imec | |
imec.internalnotes | Plenary paper | |