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Implementation of high-k gate dielectrics - a status update

dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorChen, Jerry
dc.contributor.authorCarter, Richard
dc.contributor.authorCartier, Eduard
dc.contributor.authorCaymax, Matty
dc.contributor.authorClaes, Martine
dc.contributor.authorConard, Thierry
dc.contributor.authorDelabie, Annelies
dc.contributor.authorDeweerd, Wim
dc.contributor.authorKaushik, Vidya
dc.contributor.authorKerber, Andreas
dc.contributor.authorKubicek, Stefan
dc.contributor.authorMaes, Jan
dc.contributor.authorNiwa, M.
dc.contributor.authorPantisano, Luigi
dc.contributor.authorPuurunen, Riikka
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorSchram, Tom
dc.contributor.authorShimamoto, Yasuhiro
dc.contributor.authorTsai, Wilman
dc.contributor.authorRöhr, Erika
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorWitters, Thomas
dc.contributor.authorYoung, Edward
dc.contributor.authorZhao, Chao
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-15T04:18:29Z
dc.date.available2021-10-15T04:18:29Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7405
dc.sourceIIOimport
dc.titleImplementation of high-k gate dielectrics - a status update
dc.typeProceedings paper
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.source.peerreviewno
dc.source.beginpage10
dc.source.endpage14
dc.source.conferenceExtended Abstracts of International Workshop on Gate Insulator - IWGI
dc.source.conferencedate6/11/2003
dc.source.conferencelocationTokyo Japan
imec.availabilityPublished - imec


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