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Can we increase the efficiency of organic contamination removal by ozone/Di-water processes by using additives?

dc.contributor.authorDe Smedt, Frank
dc.contributor.authorVankerckhoven, H.
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorVinckier, Chris
dc.date.accessioned2021-10-15T04:23:16Z
dc.date.available2021-10-15T04:23:16Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7446
dc.sourceIIOimport
dc.titleCan we increase the efficiency of organic contamination removal by ozone/Di-water processes by using additives?
dc.typeProceedings paper
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage215
dc.source.endpage219
dc.source.conferenceUltra Clean Processing of Silicon Surfaces 2002 - UCPSS
dc.source.conferencedate16/09/2002
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid-State Phenomena; Vol.92


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