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Alternative post-etch polymer removal in a single-wafer platform

dc.contributor.authorDundas, C.
dc.contributor.authorVroom, R.
dc.contributor.authorGhekiere, John
dc.contributor.authorVan Doorne, Patrick
dc.contributor.authorRink, I.
dc.contributor.authorSharp, I.
dc.contributor.authorHeffernan, S.
dc.date.accessioned2021-10-15T04:36:35Z
dc.date.available2021-10-15T04:36:35Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7542
dc.sourceIIOimport
dc.titleAlternative post-etch polymer removal in a single-wafer platform
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage247
dc.source.endpage251
dc.source.conferenceUltra Clean Processing of Silicon Surfaces 2002 - UCPSS
dc.source.conferencedate16/09/2002
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid-State Phenomena; Vol. 92


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