Removal of small (<100-nm) particles and metal contamination in single-wafer cleaning tool

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Authors
Eitoku, Atsuro; Snow, Jim; Vos, Rita; Sato, M.; Hirae, S.; Nakajima, K.; Nonomura, M.; Imai, M.; Mertens, Paul; Heyns, Marc
Conference
Ultra Clean Processing of Silicon Surfaces 2002 - UCPSS
Title
Removal of small (<100-nm) particles and metal contamination in single-wafer cleaning tool
Publication type
Proceedings paper
Embargo date
9999-12-31
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