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Removal of small (<100-nm) particles and metal contamination in single-wafer cleaning tool

dc.contributor.authorEitoku, Atsuro
dc.contributor.authorSnow, Jim
dc.contributor.authorVos, Rita
dc.contributor.authorSato, M.
dc.contributor.authorHirae, S.
dc.contributor.authorNakajima, K.
dc.contributor.authorNonomura, M.
dc.contributor.authorImai, M.
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-15T04:37:54Z
dc.date.available2021-10-15T04:37:54Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7551
dc.sourceIIOimport
dc.titleRemoval of small (<100-nm) particles and metal contamination in single-wafer cleaning tool
dc.typeProceedings paper
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage157
dc.source.endpage161
dc.source.conferenceUltra Clean Processing of Silicon Surfaces 2002 - UCPSS
dc.source.conferencedate16/09/2002
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid-State Phenomena; Vol. 92


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