Analysis and optimisation of the 2D-dopant profile in a 90 nm CMOS technology using scanning spreading resistance microscopy

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Authors
Eyben, Pierre; Alvarez, David; Jurczak, Gosia; Rooyackers, Rita; De Keersgieter, An; Augendre, Emmanuel; Vandervorst, Wilfried
Conference
Ultra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic.
Title
Analysis and optimisation of the 2D-dopant profile in a 90 nm CMOS technology using scanning spreading resistance microscopy
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