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Evaluation of different chlorine sources for gate oxidation

dc.contributor.authorMertens, Paul
dc.contributor.authorVermeire, Bert
dc.contributor.authorDepas, Michel
dc.contributor.authorSchaekers, Marc
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-09-29T13:11:00Z
dc.date.available2021-09-29T13:11:00Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/760
dc.sourceIIOimport
dc.titleEvaluation of different chlorine sources for gate oxidation
dc.typeProceedings paper
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorHeyns, Marc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage211
dc.source.endpage239
dc.source.conference7th Annual Dielectrics and CVD Metallization Symposium
dc.source.conferencedate6/02/1995
dc.source.conferencelocationCarlsbad, CA USA
imec.availabilityPublished - open access


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