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Chlorine detection and quantification in ALCVD HfO2 high-k dielectric films using total reflection X-ray fluorescence spectrometry

dc.contributor.authorHellin, David
dc.contributor.authorDelabie, Annelies
dc.contributor.authorPuurunen, Riikka
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorVinckier, Chris
dc.date.accessioned2021-10-15T04:53:23Z
dc.date.available2021-10-15T04:53:23Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7645
dc.sourceIIOimport
dc.titleChlorine detection and quantification in ALCVD HfO2 high-k dielectric films using total reflection X-ray fluorescence spectrometry
dc.typeMeeting abstract
dc.contributor.imecauthorHellin, David
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conference204th Meeting of the Electrochemical Society: 2nd Int. Symp. on High Dielectric Constant Materials
dc.source.conferencedate13/10/2003
dc.source.conferencelocationOrlando, FL USA
imec.availabilityPublished - imec
imec.internalnotesAbstract 569


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