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Epitaxial erbium silicide contact to silicon-germanium

dc.contributor.authorHorvath, Z.
dc.contributor.authorMolnart, G.
dc.contributor.authorPeto, G.
dc.contributor.authorDeszi, I.
dc.contributor.authorLoo, Roger
dc.contributor.authorCaymax, Matty
dc.contributor.authorZ'd'ansky, K.
dc.date.accessioned2021-10-15T04:56:32Z
dc.date.available2021-10-15T04:56:32Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7662
dc.sourceIIOimport
dc.titleEpitaxial erbium silicide contact to silicon-germanium
dc.typeOral presentation
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewno
dc.source.conferenceInternational Conference Micro- and Nanoelectronics - ICMNE
dc.source.conferencedate6/10/2003
dc.source.conferencelocationMoscow Russia
imec.availabilityPublished - imec


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